RTP (rapid thermal processing) is drawing attention as an important heating technique as the semiconductor fabrication process requires higher and higher density and smaller and smaller size.
The MILA-5000 series is a compact, low cost lamp heating unit that embodies the features of rapid heating/cooling capabilities, accurate temperature controllability, clean heating, arbitrary selection of atmosphere, and others in one temperature controller/atmosphere variable chamber.

1. Crystallization annealing of thin ferroelectric film
2. Diffuse annealing and oxide film forming annealing after ion implantation
3. Sintering and ironing treatment of silicon and compound wafer
4. Equalizing annealing of glass substrate
5. Heat cycle, thermal shock, and thermal fatigue test
6. Heating dissociation test and catalyst effect test

1. Rapid heating at a high rate of 50° per second
2. The sample is heated in a transparent quartz protective tube, allowing selector of any atmosphere of vacuum, gas, gas flow and air.
3. Both the sample temperature and program temperature are displayed simultaneously, allowing temperature control with high accuracy.